发明名称 COMPOSITION FOR FORMATION OF TRANSPARENT INSULATOR FILM
摘要 <p>The present invention is to provide a composition for forming a transparent insulating film capable of forming a transparent insulating film having excellent transparency and high permititivity, and a transparent insulating film formed of the composition for forming a transparent insulating film; and a display device having the transparent insulating film. One or more among an element group of receiving 4f or 5d electrons in a ground state, an oxide, a chelate compound, salt, and an alloy as a filling material are mixed with the composition for forming a transparent insulating film. The composition for forming a transparent insulating film comprises: (A) the filling material, (B) a compound having an alicyclic epoxy group, and (C) an acid generator, or (A) the filling material and (B2) a resin; wherein the (B2) resin comprises one among a silicon resin, polyamide-imide, polyimide, polycarbonate, polyether, polythioether, and a polymer of a monomer having ethylenically unsaturated double bonding.</p>
申请公布号 KR20140122661(A) 申请公布日期 2014.10.20
申请号 KR20140039755 申请日期 2014.04.03
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 NODA KUNIHIRO;CHISAKA HIROKI;SHIOTA DAI
分类号 H01B3/02;C08K3/02 主分类号 H01B3/02
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