| 摘要 |
PROBLEM TO BE SOLVED: To provide a production method for a polymer which can exhibit performances as designed for an intended purpose, and to provide a production method for a resist composition which can exhibit performances as designed in a resist film and can suppress generation of defects in a resist pattern.SOLUTION: A production method for a polymer includes a step of dropping a monomer solution reserved in a preparation tank 10 (vessel), the solution comprising a monomer component and a polymerization initiator, into a solvent held at a polymerization temperature in a polymerization tank 20 so as to polymerize the monomer component. The monomer solution in the preparation tank 10 is maintained at 10 to 35°C; a fluctuation range of the temperature in the monomer solution at an exit of a supply pipe 16 is maintained to 6°C or lower by adjusting the temperature of the monomer solution in the supply pipe 16 for supplying the monomer solution in the preparation tank 10 to the polymerization tank 20; and a fluctuation range of the polymerization temperature is maintained to 4°C or lower. |
