| 摘要 |
A low irritancy cleansing composition comprising: (a) one or more anionic surfactants of formula (I): wherein R1 represents a C4-36 substituted or unsubstituted hydrocarbyl group; each of R2, R3, R4 and R5 independently represents a hydrogen atom or a C1-4 alkyl group; and (b) one or more amphoteric surfactants including a sugar moiety. |
