发明名称 MEASUREMENT DEVICE FOR RESIDUE IN ATMOSPHERE, SEMICONDUCTOR MANUFACTURING DEVICE, AND MEASUREMENT METHOD FOR RESIDUE IN ATMOSPHERE
摘要 <p>PROBLEM TO BE SOLVED: To provide a technique for measuring residual moisture and organic matters with high sensitivity in a dry gas atmosphere where an object to be processed is placed.SOLUTION: When measuring moisture and organic matters in a compartment for forming a dry gas atmosphere where an object to be processed is placed, the dry gas atmosphere is drawn from the compartment into a measurement room 51 that has a lower pressure than the compartment, with pressures of both rooms separated. The measurement room 51 is evacuated by an evacuation mechanism 4 such as a turbo molecular pump or dry pump in which the evacuation speed of the dry gas is higher than the evacuation speed of the moisture and organic matters. Thus, the dry gas is evacuated; however, the moisture and organic matters are repeatedly attached and detached to and from an inner wall of the measurement room 51, remaining in the measurement room 51. Therefore, the drawing of the dry gas atmosphere into the measurement room 51 and the evacuation in the measurement room 51 are repeatedly performed, thereby increasing the concentration of the moisture and organic matters in the measurement room 51. As a result, the measurement sensitivity for the moisture and organic matters are increased.</p>
申请公布号 JP2014196980(A) 申请公布日期 2014.10.16
申请号 JP20130073425 申请日期 2013.03.29
申请人 TOKYO ELECTRON LTD 发明人 FUSE SATOSHI;MATSUO TOMOHITO;HASHIMOTO KAZUKI
分类号 G01N1/22;G01N1/00;G01N21/3504;G01N21/3554;H01L21/3065 主分类号 G01N1/22
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