发明名称 |
METHOD OF TESTING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR TESTING SYSTEM |
摘要 |
A method of testing semiconductor devices is provided includes: exposing one end of the device contact on the surface of the semiconductor; using a scanning probe microscopy apparatus to scan a diagnostic area on the semiconductor; applying a direct current bias between the conductive probe and a substrate of the semiconductor; directing a testing radiation at the diagnostic area to increase amount of free carriers in the device contacts and in the semiconductor layer under the device contacts; and detecting the current flowing through the conductive probe and the substrate, wherein a defect current signal is measured when the probe is in contact with a defective device contact and a normal current signal is measured when the probe is in contact with a normal device contact, wherein the testing radiation increases the current measured to increase the difference between the defect signal and the normal signal. |
申请公布号 |
US2014306731(A1) |
申请公布日期 |
2014.10.16 |
申请号 |
US201313949407 |
申请日期 |
2013.07.24 |
申请人 |
INOTERA MEMORIES, INC. |
发明人 |
WANG WEI-CHIH |
分类号 |
G01R31/26;G01Q60/30 |
主分类号 |
G01R31/26 |
代理机构 |
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代理人 |
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主权项 |
1. A method of testing semiconductor devices for detecting conductivity of device contacts on a semiconductor layer of a semiconductor, comprising the following steps:
exposing one end of each of the device contacts on the surface of the semiconductor ; using a scanning probe microscopy apparatus, including a cantilever and a conductive probe disposed at the free end of the cantilever, to scan a diagnostic area on the semiconductor; applying a direct current bias between the conductive probe and a substrate of the semiconductor; directing a testing radiation at the diagnostic area to increase amount of free carriers in the device contacts in the diagnostic area and the semiconductor layer under the device contacts; and detecting the current flowing through the conductive probe and the substrate, wherein a defect signal is measured when the conductive probe is in contact with a defective device contact and a normal signal is measured when the conductivity probe is in contact with a normal device contact; wherein the testing radiation increases the current measured to increase the difference between a defect signal and a normal signal. |
地址 |
Taoyuan County TW |