SUBSTRATE PROCESSING DEVICE

摘要

According to an embodiment of the present invention, a substrate processing device comprises: a chamber for providing a loading space on which a substrate is loaded and a processing space on which a process for the substrate is performed; a boat including one or more boat frames uprightly arranged along the up-down direction and movable to the loading space or the processing space while being raised/lowered; a plurality of susceptors installed on the boat frame, arranged along the lengthwise direction of the boat frame to be spaced apart from each other, and sequentially placed on the upper surface of the substrate as the boat moves to the processing space; one or more holders including a vertical rod arranged in parallel to the boat frame and a substrate support tip protruding from the inner surface of the vertical rod to support the substrate, the vertical rod relatively moving along the lengthwise direction of the boat frame when the boat moves to the processing space.