ELECTRON BEAM WRITING DEVICE, ELECTRON BEAM WRITING METHOD, AND RECORDING MEDIUM

摘要

[Problem] In a conventional electron beam writing device, the total number of rectangles when fracturing has been large, and writing time has been long. [Solution] An electron beam writing device is provided with: a receiving unit which receives input feature information which is information indicating one or more features; a feature width acquisition unit which acquires widths of each of one or more features indicated by the input feature information; a creation unit which creates approximate feature information indicating one or more approximate features, which are features configured from one or more rectangles that conform with widths of the first-mentioned features, and which are features approximating each of the one or more features indicated by the input feature information; and a writing unit which writes the one or more approximate features indicated by the approximate feature information created by the creation unit. By way of the electron beam writing device, it is possible to reduce the total number of rectangles when fracturing and thereby reduce writing time.