发明名称 PROCESS FOR PRODUCING THREE-DIMENSIONAL CONDUCTIVE PATTERN STRUCTURE, AND MATERIAL FOR THREE-DIMENSIONAL MOLDING FOR USE THEREIN
摘要 <p>[Problem] To provide: a material which is for three-dimensional molding and on which a conductive pattern that exhibits excellent adhesiveness even after the three-dimensional molding can be formed; and a process for producing a three-dimensional conductive pattern structure, said process using this material for three-dimensional molding and necessitating no special apparatus. [Solution] This three-dimensional conductive pattern structure is produced by: using a material which is for three-dimensional molding and which has, in at least a part thereof, a surface made of a polyimide resin; conducting, in a surface portion (1) made of a polyimide resin, the formation of a modified pattern and then the adsorption and reduction of metal ions to form a material which is provided with a pattern (2) having a plating-catalyzing activity; and subjecting the material which is provided with the pattern (2) to three-dimensional molding and electroless plating successively.</p>
申请公布号 WO2014168220(A1) 申请公布日期 2014.10.16
申请号 WO2014JP60437 申请日期 2014.04.10
申请人 SEIREN CO., LTD. 发明人 UESUGI TAKASHI;TSUJIMOTO KAZUHISA
分类号 C23C18/16;H05K1/02;H05K3/00;H05K3/18;H05K3/38 主分类号 C23C18/16
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