发明名称 |
RESIN AND RESIST COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition that provides better line edge roughness and better mask error factor.SOLUTION: The resist composition comprises resin comprising a structural unit derived from a compound of the formula (aa), and a following basic compound. |
申请公布号 |
JP2014197200(A) |
申请公布日期 |
2014.10.16 |
申请号 |
JP20140094943 |
申请日期 |
2014.05.02 |
申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
ICHIKAWA KOJI;FUJI YUSUKE;YAMAGUCHI NORIFUMI |
分类号 |
G03F7/039;C08F20/28;G03F7/004 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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