发明名称 RESIN AND RESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition that provides better line edge roughness and better mask error factor.SOLUTION: The resist composition comprises resin comprising a structural unit derived from a compound of the formula (aa), and a following basic compound.
申请公布号 JP2014197200(A) 申请公布日期 2014.10.16
申请号 JP20140094943 申请日期 2014.05.02
申请人 SUMITOMO CHEMICAL CO LTD 发明人 ICHIKAWA KOJI;FUJI YUSUKE;YAMAGUCHI NORIFUMI
分类号 G03F7/039;C08F20/28;G03F7/004 主分类号 G03F7/039
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