SPUTTERING TARGET HAVING INCREASED POWER COMPATIBILITY

摘要

The invention relates to a plate centering system, comprising a plate having a holder, wherein the plate is centered in the holder both at room temperatures and at higher temperatures, independently of the heat expansion of the plate and the holder, and wherein the plate can freely expand in the holder at higher temperatures. The invention relates in particular to a target having a target comprising a frame-shaped target mount, which is very well suited in a coating source for high power impulse magnetron sputtering of the target.