发明名称 MULTI-STEP ION IMPLANTATION
摘要 Systems and methods for strengthening a sapphire part are described herein. One embodiment may take the form of a method including orienting a first surface of a sapphire member relative to an ion implantation device and performing a first implantation step. The implanting step may include directing ions at the first surface of the sapphire member to embed them under the first surface. The systems and methods may also include one or more of heating the sapphire member to diffuse the implanted ions into deeper layers of sapphire member, cooling the sapphire member, and performing at least a second implantation step directing ions at the first surface of the sapphire member to embed the ions under the first surface.
申请公布号 EP2789004(A1) 申请公布日期 2014.10.15
申请号 EP20130707246 申请日期 2013.02.12
申请人 APPLE INC. 发明人 MEMERING, DALE N.;MYERS, SCOTT A.;WEBER, DOUGLAS
分类号 H01J37/317;C30B31/22 主分类号 H01J37/317
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