发明名称 |
LINEAR TYPE DEPOSITION RATE SENSOR |
摘要 |
<p>The present invention relates to a deposition rate sensor for measuring a deposition rate of the whole length of a linear evaporation source used in a process of mass-producing semiconductors, displays, lamps, solar cells. The deposition rate sensor with a new configuration is to measure the deposition rate of the whole including not only the end but also the center of a long linear evaporation source or an evaporation source group with linear arrangement. The present invention provides the deposition rate sensor for detecting and measuring the deposition rate of the linear deposition source by loading a sensor array including three or more deposition rate sensors on a tray and transferring the tray into a chamber in which the linear deposition source is operated in a state where the linear evaporation source is operated.</p> |
申请公布号 |
KR20140121008(A) |
申请公布日期 |
2014.10.15 |
申请号 |
KR20130036667 |
申请日期 |
2013.04.04 |
申请人 |
YAS CO., LTD. |
发明人 |
TAK, SEONG HUN;JEONG, IN SEUNG;KIM, SANG HO;CHOI, JI YUN;KIM, SEONG MOON;JEONG, KWANG HO |
分类号 |
C23C14/24 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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