CASCADE DESIGN SHOWERHEAD FOR TRANSIENT UNIFORMITY

摘要

Disclosed is a device for semiconductor processing operations which distribute a process gas across a semiconductor wafer. A device can include at least one ring-type baffle arranged in the stack of ring-type baffles in a plenum volume of the device. Each ring-type baffle can have a center-diameter practically equal to the internal diameter and the external diameter of the baffle in the ring-type baffle layer. The ring-type baffles can be arranged with a cascade method.