发明名称 Thin film transistor and method of fabricating the same using an organic semconductor layer and an organic acceptor-donor layer
摘要 A thin film transistor including a contact layer that contains an organic semiconductor layer over a substrate, a contact layer containing an organic semiconductor material, an acceptor or donor material provided between an organic semiconductor layer, and a source electrode and a drain electrode at opposite end portions of the contact layer; and a method of fabricating same.
申请公布号 US8859326(B2) 申请公布日期 2014.10.14
申请号 US201113154038 申请日期 2011.06.06
申请人 Sony Corporation 发明人 Ushikura Shinichi;Katsuhara Mao
分类号 H01L51/40;H01L51/05;H01L51/52;H01L51/00 主分类号 H01L51/40
代理机构 Dentons US LLP 代理人 Dentons US LLP
主权项 1. A method of manufacturing a thin film transistor comprising: providing a substrate with a gate electrode and a gate insulating layer thereon, in that order proceeding from the substrate, the gate insulating layer having a planar surface facing away from the substrate; forming an organic semiconductor layer extending along only one plane of the gate insulating layer and not beyond the one plane of the gate insulating layer, the organic semiconductor layer having an island shape; forming a contact layer containing (a) an organic semiconductor material and an acceptor material or (b) an organic semiconductor material and a donor material on the organic semiconductor layer; patterning the organic semiconductor layer and the contact layer in the same form; forming a source electrode and drain electrode with end portions thereof on opposite ends of the contact layer; and removing the acceptor material or the donor material from the contact layer using the source and drain electrodes as a mask, wherein the step of forming the source and drain electrodes is performed between the step of patterning and the step of removing the acceptor material or donor material.
地址 Tokyo JP