Pattern forming method, positional deviation measuring method and photomask

摘要

According to one embodiment, a positional deviation measuring method includes measuring a positional deviation of a device pattern formed in a lower layer portion using an alignment mark of the lower layer portion as a reference; measuring a positional deviation of a device pattern formed in an upper layer portion above the lower layer portion using an alignment mark of the upper layer portion as a reference; measuring a positional deviation between the alignment mark of the lower layer portion and the alignment mark of the upper layer portion; and calculating a positional deviation between the device patterns based on the positional deviation between the alignment marks.

主权项

1. A photomask comprising:
a pair of first patterns, and a pair of second patterns that have a positional deviation amount of weighted centers different from that of the first patterns.