发明名称 |
High sensitivity plasmonic structures for use in surface plasmon resonance sensors and method of fabrication thereof |
摘要 |
There is disclosed a method for fabricating a plasmonic structure for use in a surface plasmon resonance sensor, comprising: coating a surface of an optically clear substrate with a monolayer of microspheres forming a sphere mask; etching the sphere mask to produce an array of microholes; depositing an adsorption layer on the etched sphere mask and the surface of the optically clear substrate; depositing a metallic film on the adsorption layer; and removing the sphere mask. This is also disclosed a plasmonic structure for use in a surface plasmon resonance sensor, comprising: an adsorption layer; and a metallic film deposited on the adsorption layer; wherein the adsorption layer and the metallic film comprises an array of microholes. |
申请公布号 |
US8860943(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201013320045 |
申请日期 |
2010.05.12 |
申请人 |
Valorisation-Recherche, Limited Partnership |
发明人 |
Masson Jean-François;Live Ludovic S.;Murray-Méthot Marie-Pier |
分类号 |
G01N21/55 |
主分类号 |
G01N21/55 |
代理机构 |
Norton Rose Fulbright Canada LLP |
代理人 |
Norton Rose Fulbright Canada LLP ;Daoust Alexandre |
主权项 |
1. A method for fabricating a plasmonic structure for use in a surface plasmon resonance sensor, comprising:
coating a surface of an optically clear substrate with a monolayer of microspheres forming a sphere mask; etching the sphere mask to produce an array of microholes; depositing an adsorption layer on the etched sphere mask and the surface of the optically clear substrate; depositing a metallic film on the adsorption layer; and removing the sphere mask. |
地址 |
Montreal, QC unknown |