发明名称 High sensitivity plasmonic structures for use in surface plasmon resonance sensors and method of fabrication thereof
摘要 There is disclosed a method for fabricating a plasmonic structure for use in a surface plasmon resonance sensor, comprising: coating a surface of an optically clear substrate with a monolayer of microspheres forming a sphere mask; etching the sphere mask to produce an array of microholes; depositing an adsorption layer on the etched sphere mask and the surface of the optically clear substrate; depositing a metallic film on the adsorption layer; and removing the sphere mask. This is also disclosed a plasmonic structure for use in a surface plasmon resonance sensor, comprising: an adsorption layer; and a metallic film deposited on the adsorption layer; wherein the adsorption layer and the metallic film comprises an array of microholes.
申请公布号 US8860943(B2) 申请公布日期 2014.10.14
申请号 US201013320045 申请日期 2010.05.12
申请人 Valorisation-Recherche, Limited Partnership 发明人 Masson Jean-François;Live Ludovic S.;Murray-Méthot Marie-Pier
分类号 G01N21/55 主分类号 G01N21/55
代理机构 Norton Rose Fulbright Canada LLP 代理人 Norton Rose Fulbright Canada LLP ;Daoust Alexandre
主权项 1. A method for fabricating a plasmonic structure for use in a surface plasmon resonance sensor, comprising: coating a surface of an optically clear substrate with a monolayer of microspheres forming a sphere mask; etching the sphere mask to produce an array of microholes; depositing an adsorption layer on the etched sphere mask and the surface of the optically clear substrate; depositing a metallic film on the adsorption layer; and removing the sphere mask.
地址 Montreal, QC unknown