发明名称 |
Method for producing magnetic recording medium and magnetic recording replaying device |
摘要 |
A production method of a magnetic recording medium of the present invention includes: a step of forming a magnetic layer (2) on a non-magnetic substrate (1); a step of forming a dissoluble layer (3) on the magnetic layer (2); a step of forming a mask layer (4) on the dissoluble layer (3); a step of patterning the dissoluble layer (3) and the mask layer (4) to a shape corresponding to a magnetic recording pattern (2a); a step of performing a partial modification or removal of the magnetic layer (2) by use of the patterned mask layer (4); and a step of dissolving the dissoluble layer (3) with a chemical agent so as to remove the dissoluble layer (3) together with the mask layer (4) formed thereon from the top of the magnetic layer (2), wherein the magnetic recording medium has the magnetically-separated magnetic recording pattern (2a). |
申请公布号 |
US8859033(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201013502970 |
申请日期 |
2010.10.20 |
申请人 |
Showa Denko K.K. |
发明人 |
Ueda Manabu;Murakami Yuji;Sakawaki Akira;Wang Zhipeng |
分类号 |
G11B5/855;B05D1/32 |
主分类号 |
G11B5/855 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. A production method of a magnetic recording medium, which has a magnetically-separated magnetic recording pattern, comprising:
a step of forming a magnetic layer on a non-magnetic substrate; a step of forming a dissoluble layer on the magnetic layer, wherein the dissoluble layer comprises a combination of a CrTi layer on a molybdenum layer; a step of forming a mask layer on the dissoluble layer; a step of patterning the dissoluble layer and the mask layer to a shape corresponding to the magnetic recording pattern; a step of performing a partial modification or removal of the magnetic layer by use of the patterned mask layer; and a step of dissolving the patterned dissoluble layer with at least one chemical agent selected from the group consisting of a hydrogen peroxide solution, sulfuric acid, nitric acid, and phosphoric acid so as to remove the patterned dissoluble layer together with the patterned mask layer formed thereon from the top of the magnetic layer. |
地址 |
Tokyo JP |