Optical proximity correction method based on hybrid simulation model

摘要

An optical proximity correction (OPC) method is disclosed, in which original design patterns are first grouped into a first group and a second group, wherein each pattern of the first group has a size greater than a size of any pattern of the second group. Next, a simple OPC model and a complex OPC model are individually established for the two groups using different numbers of convolution kernels. After that, the simple OPC model and the complex OPC model are combined together to generate a hybrid OPC model which is thereafter used to perform an OPC treatment on the original design patterns. This method is capable of shortening the OPC processing time and increasing the flexibility in utilizing OPC software and hardware resources.

主权项

1. An optical proximity correction (OPC) method, comprising the steps of:
providing original design patterns; grouping the original design patterns into a first group and a second group, wherein each pattern of the first group has a size larger than a size of any pattern of the second group; establishing a simple OPC model for patterns of the first group using a relatively small number of convolution kernels; establishing a complex OPC model for patterns of the second group using a relatively great number of convolution kernels; combining the simple and complex OPC models to generate a hybrid OPC model; and performing an OPC treatment on the original design patterns based on the hybrid OPC model.