发明名称 |
Negative pattern forming method and resist pattern |
摘要 |
A negative pattern forming method, includes: (i) forming a film having a film thickness of 200 nm or more from a chemical amplification resist composition containing (A) a resin capable of increasing a polarity of the resin (A) by an action of an acid to decrease a solubility of the resin (A) for a developer containing one or more organic solvents, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film with a developer containing one or more organic solvents. |
申请公布号 |
US8859192(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201313904236 |
申请日期 |
2013.05.29 |
申请人 |
FUJIFILM Corporation |
发明人 |
Kato Keita;Fujii Kana;Kamimura Sou;Iwato Kaoru |
分类号 |
G03F7/20;G03F7/039;G03F7/32;G03F7/40 |
主分类号 |
G03F7/20 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. A negative pattern forming method, comprising:
(i) forming a film having a film thickness of 200 nm or more from a chemical amplification resist composition containing (A) a resin capable of increasing a polarity of the resin (A) by an action of an acid to decrease a solubility of the resin (A) for a developer containing one or more organic solvents, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film with a developer containing one or more organic solvents, wherein: the film formed from the chemical amplification resist composition is formed on a substrate not coated with a bottom anti-reflection coating; the substrate not coated with a bottom anti-reflection coating is a stepped substrate having a step of 10 nm or more in height; a step in the stepped substrate has a space of 20 nm to 200 nm; and the dissolution rate of the film formed of the resin (A) for butyl acetate at 25° C. is 25 nm/sec or more. |
地址 |
Tokyo JP |