发明名称 |
PLASMA GENERATOR AND REACTION CHAMBER FOR THIN FILM DEPOSITION, WHICH COMPRISES THE SAME |
摘要 |
The present invention relates to a plasma generator and a reaction chamber for a thin film deposition including the same. More particularly, the present invention relates to a plasma generator and a reaction chamber for a thin film deposition including the same, capable of improving a step coverage by stably supplying reactive material radicals and plasma with high density. |
申请公布号 |
KR20140120726(A) |
申请公布日期 |
2014.10.14 |
申请号 |
KR20130036962 |
申请日期 |
2013.04.04 |
申请人 |
TES CO., LTD. |
发明人 |
CHUNG, WOO YOUNG;YANG, JAE HOON;SEO, KYEUNG CHEUN |
分类号 |
H05H1/46;C23C16/50;H01L21/205 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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