发明名称 |
Semiconductor device and method for manufacturing the same |
摘要 |
An antifuse of a semiconductor device includes a semiconductor substrate including a device isolation layer and an active region, a gate structure extending across an interface between the device isolation layer and the active region, a contact coupled to at least a portion of a sidewall of the gate structure, and a metal interconnection provided on the contact and gate structure. |
申请公布号 |
US8860177(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201213719075 |
申请日期 |
2012.12.18 |
申请人 |
SK hynix Inc. |
发明人 |
Jang Chi Hwan |
分类号 |
H01L23/52;H01L29/40;H01L23/525;H01L29/78 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
|
主权项 |
1. A semiconductor device with an antifuse unit, the antifuse unit comprising:
a semiconductor substrate including a device isolation layer and an active region; a gate structure extending across an interface between the device isolation layer and the active region, the gate structure including a layer that is configured to be ruptured in an antifuse operation; a contact surrounding all sidewalls of the gate structure; and a metal interconnection provided on the contact and the gate structure. |
地址 |
Icheon KR |