发明名称 Semiconductor device and method for manufacturing the same
摘要 An antifuse of a semiconductor device includes a semiconductor substrate including a device isolation layer and an active region, a gate structure extending across an interface between the device isolation layer and the active region, a contact coupled to at least a portion of a sidewall of the gate structure, and a metal interconnection provided on the contact and gate structure.
申请公布号 US8860177(B2) 申请公布日期 2014.10.14
申请号 US201213719075 申请日期 2012.12.18
申请人 SK hynix Inc. 发明人 Jang Chi Hwan
分类号 H01L23/52;H01L29/40;H01L23/525;H01L29/78 主分类号 H01L23/52
代理机构 代理人
主权项 1. A semiconductor device with an antifuse unit, the antifuse unit comprising: a semiconductor substrate including a device isolation layer and an active region; a gate structure extending across an interface between the device isolation layer and the active region, the gate structure including a layer that is configured to be ruptured in an antifuse operation; a contact surrounding all sidewalls of the gate structure; and a metal interconnection provided on the contact and the gate structure.
地址 Icheon KR
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