发明名称 Method of manufacturing semiconductor device
摘要 A semiconductor device includes a storage node contact plug, a bit line in communication with to the storage node contact plug, and an expansion unit formed on a sidewall of the bit line. Thermal expansion of the expansion unit serves to increase capacitance by ensuring a distance between the bit line and the storage node contact plug, thereby improving a sensing margin. A cell characteristic such as a record recovery time (tWR) may be enhanced.
申请公布号 US8860226(B2) 申请公布日期 2014.10.14
申请号 US201213346910 申请日期 2012.01.10
申请人 Hynix Semiconductor Inc. 发明人 Seo Yong Won
分类号 H01L23/52;H01L27/108;H01L29/423;H01L21/768;H01L29/417 主分类号 H01L23/52
代理机构 代理人
主权项 1. A semiconductor device, comprising: a bit line contact plug formed over a semiconductor substrate; a bit line coupled to the bit line contact plug, the bit line including a bit line conductive layer and a hard mask layer; and an expansion unit disposed on a sidewall of the bit line conductive layer and the bit line contact plug, wherein a width of a central portion of the expansion unit is greater than a width of an upper portion of the expansion unit and a width of a lower portion of the expansion unit.
地址 Icheon-Si KR
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