发明名称 |
Method of manufacturing semiconductor device |
摘要 |
A semiconductor device includes a storage node contact plug, a bit line in communication with to the storage node contact plug, and an expansion unit formed on a sidewall of the bit line. Thermal expansion of the expansion unit serves to increase capacitance by ensuring a distance between the bit line and the storage node contact plug, thereby improving a sensing margin. A cell characteristic such as a record recovery time (tWR) may be enhanced. |
申请公布号 |
US8860226(B2) |
申请公布日期 |
2014.10.14 |
申请号 |
US201213346910 |
申请日期 |
2012.01.10 |
申请人 |
Hynix Semiconductor Inc. |
发明人 |
Seo Yong Won |
分类号 |
H01L23/52;H01L27/108;H01L29/423;H01L21/768;H01L29/417 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device, comprising:
a bit line contact plug formed over a semiconductor substrate; a bit line coupled to the bit line contact plug, the bit line including a bit line conductive layer and a hard mask layer; and an expansion unit disposed on a sidewall of the bit line conductive layer and the bit line contact plug, wherein a width of a central portion of the expansion unit is greater than a width of an upper portion of the expansion unit and a width of a lower portion of the expansion unit. |
地址 |
Icheon-Si KR |