Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition

摘要

A polyimide precursor and a polyimide precursor resin composition, the polyimide precursor having repeating units represented by formula (1) and a photosensitive resin composition comprising the polyimide precursor and a photoacid generator or photobase generator:;
where R1 is a tetravalent organic group; R2 is a divalent organic group; R1s may be the same or different from each other and R2s may be the same or different from each other in the repeating units; R3 and R4 respectively represent a monovalent organic group having a structure represented by formula (2) and may be the same or different from each other; and R3s and R4s in the repeating units may be the same or different from each other, respectively. R5, R6, R7 and R8 are as described in the specification.

主权项

1. A polyimide precursor comprising repeating units represented by the following formula (1) of 100 mole % in all the repeating units: wherein R1 is a tetravalent organic group; R2 is a divalent organic group; R1s may be the same or different from each other and R2 s may be the same or different from each other in the repeating units; R3 and R4 each independently represent a monovalent organic group having a structure represented by the following formula (2) and may be the same or different from each other; R3 s may be the same or different from each other and R4 s may be the same or different from each other in the repeating units; and n is the number of the repeating units: wherein R5, R6 and R7 each independently represent a hydrogen atom, a halogen atom or a monovalent organic group; R8 is a monovalent organic group which is a mixture consisting of A1 and A2; A1 and A3; or A1, A2 and A3, wherein A1 is a group consisting of organic groups in which the carbon atom bonded at R8 to the oxygen atom is a primary carbon atom; A2 is a group consisting of organic groups in which the carbon atom bonded at R8 to the oxygen atom is a secondary carbon atom; and A3 is a group of organic groups in which the carbon atom bonded at R8 to the oxygen atom is a tertiary carbon atom, R8 s may be the same or different from each other in the repeating units; 35 mole % or less of R8s are organic groups having a reactive group selected from the group consisting of an ethylenic unsaturated bond, a glycidyl group, an oxetanyl group, and an isocyanuric group; and R5, R6 , R7 and R8 may be bonded to each other to form a ring structure.