Resist composition and method for producing resist pattern

摘要

A resist composition contains (A) a resin having a structural unit represented by the formula (I), (B) an acid generator and (D) a compound represented by the formula (II),;wherein R1, ring X1, R3, R4, m, and n are defined in the specification.

主权项

1. A resist composition comprising:
(A) a resin having a structural unit represented by the formula (IA); (B) an acid generator; (D) a compound represented by the formula (II); wherein R23 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; R24 and R25 in each occurrence independently represent a hydrogen atom or a C1 to C24 hydrocarbon group, and R26 to R29 independently represent a hydrogen atom or a C1 to C24 hydrocarbon group, or at least two of R24 to R29 may be bonded together to form a C3 to C30 ring, one or more hydrogen atoms contained in the hydrocarbon group or the ring may be replaced by a halogen atom, a hydroxy group, a C1 to C12 alkyl group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group or a C2 to C4 acyloxy group, and one or more —CH2— contained in the hydrocarbon group or the ring may be replaced by —CO— or —O—; n′ represents an integer of 0 to 3; wherein R3 and R4 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C1 to C7 acyl group, a C1 to C7 acyloxy group, a C1 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4; and a solvent.