Applying different pressures through sub-pad to fixed abrasive CMP pad

摘要

A chemical mechanical polishing (CMP) system includes a rotating polishing table including a platen providing at least two pressure zones having different pressures; a sub-pad positioned on the platen, the sub-pad including a plurality of openings allowing for transmission of the different pressures therethrough; a fixed abrasive pad positioned on the sub-pad; and a pressure-creating system sealingly coupled to the platen for creating a different pressure in the at least two pressure zones, wherein the different pressures create topography on the fixed abrasive pad. A sub-pad and related method are also provided.

主权项

1. A chemical mechanical polishing (CMP) system comprising:
a rotating polishing table including a platen providing at least two pressure zones having different pressures; a sub-pad positioned on the platen, the sub-pad including a plurality of openings allowing for transmission of the different pressures therethrough; a fixed abrasive pad positioned on the sub-pad; a pressure-creating system sealingly coupled by a manifold to the platen for creating a different pressure in the at least two pressure zones, wherein the manifold sealingly communicates through a plurality of circumferential grooves in a periphery of the platen, and wherein the different pressures create topography on the fixed abrasive pad; and a plurality of passages for conveying gas to the at least two pressure zones, wherein each passage conveys a gas at one of the different pressures, and wherein each passage comprises a connection to the pressure creating system and at least two branches for delivering a same pressure.