发明名称 Semiconductor device, semiconductor device manufacturing method, and electronic device
摘要 A semiconductor device includes an insulation layer, a first semiconductor element and a second semiconductor element which are disposed within the insulation layer, a frame which has higher thermal conductivity than the insulation layer and surrounds the first semiconductor element and the second semiconductor element via the insulation layer, and a wiring layer which is disposed over the insulation layer and includes an electrode which electrically connects the first semiconductor element and the second semiconductor element.
申请公布号 US8860211(B2) 申请公布日期 2014.10.14
申请号 US201213648397 申请日期 2012.10.10
申请人 Fujitsu Limited 发明人 Kon Junichi
分类号 H01L23/34 主分类号 H01L23/34
代理机构 Kratz, Quintos & Hanson, LLP 代理人 Kratz, Quintos & Hanson, LLP
主权项 1. A semiconductor device, comprising: an insulation layer; a first semiconductor element and a second semiconductor element which are disposed within the insulation layer; a frame that has higher thermal conductivity than the insulation layer and surrounds the first semiconductor element and the second semiconductor element via the insulation layer, wherein the frame is not disposed between the first semiconductor element and the second semiconductor element; and a wiring layer that is disposed over the insulation layer and includes an electrode which electrically connects the first semiconductor element and the second semiconductor element.
地址 Kawasaki JP