发明名称 MULTILAYER PROTECTIVE SHEET FOR A SEMICONDUCTOR WAFER AND STRUCTURE COMPRISING SAID WAFER AND SHEET, METHOD FOR PROTECTING SEMICONDUCTOR WAFER AND METHOD FOR PROCESSING SEMICONDUCTOR WAFER
摘要 Disclosed herein is a semiconductor wafer protection structure including a semiconductor wafer and a protective sheet overlaid on a circuit surface of the semiconductor wafer, wherein the protective sheet has a larger diameter than the outer diameter of the semiconductor wafer. <??>The invention provides semiconductor wafer protection structures and methods, and laminated protective sheet for use therein that enable prevention of damage to a wafer during grinding and transportation when the wafer is ground to an ultrathin thickness and transported. Also provided is a process for processing a semiconductor wafer whereby damage to the wafer can be reduced during application and cutting of an adhesive sheet. <IMAGE>
申请公布号 PT2270848(E) 申请公布日期 2014.10.14
申请号 PT20100010202T 申请日期 2003.08.21
申请人 LINTEC CORPORATION 发明人 KOICHI NAGAMOTO;KATSUHIKO HORIGOME;HITOSHI OHASHI;HIDEO SENOO
分类号 H01L21/683;B24B37/30;C09J7/02;H01L21/304;H01L21/68 主分类号 H01L21/683
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