发明名称 THIN FILM TRANSISTOR SUBSTRATE OF DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p>The present invention relates to a thin film transistor (TFT) substrate of a display device capable of preventing an error due to the oxidation of the surface of a gate electrode, and a method of manufacturing the same. A thin film transistor (TFT) substrate of a display device according to one embodiment of the present invention includes a gate electrode formed on a base substrate; a first gate insulating layer covering the gate electrode; a second gate insulating layer formed on the first gate insulating layer; a semiconductor layer overlapped with the gate electrode on the second gate insulating layer; an etch stop layer partly formed in the upper part of the semiconductor layer; a source electrode formed on one side of the semiconductor layer; and a drain electrode formed on the other side of the semiconductor layer. The first gate insulating layer and the second gate insulating layer are formed with the same material.</p>
申请公布号 KR20140120415(A) 申请公布日期 2014.10.14
申请号 KR20130035801 申请日期 2013.04.02
申请人 LG DISPLAY CO., LTD. 发明人 YANG, HEE JUNG;KIM, BONG CHUL;HAN, GYU WON;LEE, JEONG HOON;HO, WON JOON
分类号 H01L29/786;G02F1/136;H01L21/336;H01L51/50 主分类号 H01L29/786
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