发明名称 |
THIN FILM TRANSISTOR SUBSTRATE OF DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<p>The present invention relates to a thin film transistor (TFT) substrate of a display device capable of preventing an error due to the oxidation of the surface of a gate electrode, and a method of manufacturing the same. A thin film transistor (TFT) substrate of a display device according to one embodiment of the present invention includes a gate electrode formed on a base substrate; a first gate insulating layer covering the gate electrode; a second gate insulating layer formed on the first gate insulating layer; a semiconductor layer overlapped with the gate electrode on the second gate insulating layer; an etch stop layer partly formed in the upper part of the semiconductor layer; a source electrode formed on one side of the semiconductor layer; and a drain electrode formed on the other side of the semiconductor layer. The first gate insulating layer and the second gate insulating layer are formed with the same material.</p> |
申请公布号 |
KR20140120415(A) |
申请公布日期 |
2014.10.14 |
申请号 |
KR20130035801 |
申请日期 |
2013.04.02 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
YANG, HEE JUNG;KIM, BONG CHUL;HAN, GYU WON;LEE, JEONG HOON;HO, WON JOON |
分类号 |
H01L29/786;G02F1/136;H01L21/336;H01L51/50 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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