| 发明名称 | Curable composition for imprint, patterning method and pattern | ||
| 摘要 | A curable composition for imprints, which is excellent in patternability and in line edge roughness, is provided. The curable composition for imprints comprises at least one kind of polymerizable monomer (A) and at least one kind of photopolymerization initiator (B). The polymerizable monomer (A) comprises at least two fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkylether group and each of two of the fluorine-containing groups is connected with each other through a linking group having at least two carbon atoms. | ||
| 申请公布号 | US8859071(B2) | 申请公布日期 | 2014.10.14 |
| 申请号 | US201012991082 | 申请日期 | 2010.03.08 |
| 申请人 | FUJIFILM Corporation | 发明人 | Kodama Kunihiko |
| 分类号 | B32B3/00;C08F22/10;C08F20/38;C08F22/24;C08F22/18;G03F7/027;B82Y40/00;G03F7/004;B82Y10/00;C08F20/22;G03F7/00 | 主分类号 | B32B3/00 |
| 代理机构 | Sughrue Mion, PLLC | 代理人 | Sughrue Mion, PLLC |
| 主权项 | 1. A curable composition for imprints comprising at least one polymerizable monomer (A) and at least one photopolymerization initiator (B), wherein the polymerizable monomer (A) comprises at least two of fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkylether group, each of two of the fluorine-containing groups is connected with each other through a linking group having at least two carbon atoms, the linking group comprises a sulfide bond, and the polymerizable monomer (A) comprises at least two polymerizable groups. | ||
| 地址 | Tokyo JP | ||