| 摘要 |
The present invention relates to a base plane setting method for inspecting a substrate. The method includes a step of obtaining the height information of reference masks formed around a first local region on a substrate, and a step of determining a base plane with regard to the first local region by using the obtained height information. The reference masks are formed around the first local region. When a substrate inspection process is performed by using the base plane set by the method, the reliability of the inspection result can be improved. |
