发明名称 DUAL WORK FUNCTION GATE STRUCTURES
摘要 A semiconductor chip having a transistor is described. The transistor having a gate electrode disposed over a gate dielectric. The gate electrode comprised of first gate material disposed on the gate dielectric and second gate material disposed on the gate dielectric. The first gate material being different than the second gate material. The second gate material also located at a source region or drain region of said gate electrode.
申请公布号 KR101447430(B1) 申请公布日期 2014.10.13
申请号 KR20127016888 申请日期 2010.12.02
申请人 发明人
分类号 H01L21/8238;H01L27/092 主分类号 H01L21/8238
代理机构 代理人
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