| 摘要 |
FIELD: measuring instrumentation.SUBSTANCE: invention refers to methods of low gas pressure measurement in gas discharge chambers where plasma focus in the form of non-cylindrical Z-pinch is generated with current sheath of funnel-type form, and can be applied in such areas as high-power impulse electrophysics, plasma physics, where work gas pressure measurement is necessary in gas discharge chambers of plasma focus in 1-50 mmHg range. Method of gas pressure measurement in soldered discharge chambers of plasma focus involves supply of high voltage to discharge chamber electrodes, measurement of monitored parameter of plasma focus chamber, and determination of gas pressure by calibration curve of pressure dependence on the monitored parameter for this type of plasma focus discharge chamber; high voltage is supplied from capacitor, time interval from current increase start to abrupt fall (singularity time) is measured as a monitored parameter in oscillogram of discharge current running through plasma focus discharge chamber, and gas pressure is determined with obtained time interval value by calibration curve of gas pressure dependence on singularity time under supplied voltage for this plasma focus discharge chamber type.EFFECT: possible measurement of non-/radioactive work gas pressure in unsoldered plasma focus chamber.4 dwg |
