发明名称 ABRASIVE PAD PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide an abrasive pad production method capable of improving polishing efficiency by including a resin for improving residence performance with respect to a polishing material (abrasive grain) used for polishing to a nap layer easily.SOLUTION: A resin capable of being coagulated by wet coagulation is mixed to a dimethyl formamide (DMF) liquid used as a solvent, and then a hydrophilic resin in which a contact angle when being dropped a polishing liquid of 2 micro litres is 65 degree or lower is added for forming a resin solution. The resin solution is coated to a base material, and the base material to which the resin solution is coated is immersed to a coagulation liquid and is subjected to wet coagulation for forming a nap layer.
申请公布号 JP2014193518(A) 申请公布日期 2014.10.09
申请号 JP20130175406 申请日期 2013.08.27
申请人 CRYSTAL KOGAKU:KK;RITSUMEIKAN 发明人 TANI YASUHIRO;MURATA JUNJI;KIRINO CHUJI
分类号 B24B37/24;C08J5/14;H01L21/304 主分类号 B24B37/24
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