发明名称 |
ABRASIVE PAD PRODUCTION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide an abrasive pad production method capable of improving polishing efficiency by including a resin for improving residence performance with respect to a polishing material (abrasive grain) used for polishing to a nap layer easily.SOLUTION: A resin capable of being coagulated by wet coagulation is mixed to a dimethyl formamide (DMF) liquid used as a solvent, and then a hydrophilic resin in which a contact angle when being dropped a polishing liquid of 2 micro litres is 65 degree or lower is added for forming a resin solution. The resin solution is coated to a base material, and the base material to which the resin solution is coated is immersed to a coagulation liquid and is subjected to wet coagulation for forming a nap layer. |
申请公布号 |
JP2014193518(A) |
申请公布日期 |
2014.10.09 |
申请号 |
JP20130175406 |
申请日期 |
2013.08.27 |
申请人 |
CRYSTAL KOGAKU:KK;RITSUMEIKAN |
发明人 |
TANI YASUHIRO;MURATA JUNJI;KIRINO CHUJI |
分类号 |
B24B37/24;C08J5/14;H01L21/304 |
主分类号 |
B24B37/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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