NIOBIUM OXIDE SPUTTERING TARGET, PRODUCTION METHOD THEREOF AND NIOBIUM OXIDE FILM

摘要

PROBLEM TO BE SOLVED: To provide a niobium oxide sputtering target capable of direct-current (DC) sputtering, and to provide a production method thereof.SOLUTION: A niobium oxide sputtering target is produced by a production method having a reduction step for obtaining oxygen deficiency niobium oxide powder by applying a reduction treatment to the niobium oxide powder, a mixing step for reducing dispersion of the oxygen content in the obtained oxygen deficiency niobium oxide powder as the need arises, and a sintering step for obtaining a sintered body in a non-oxidative atmosphere. The specific resistance in the whole area in the thickness direction of the sintered body is 0.001 to 0.05 &OHgr;-cm.