ILLUMINATION OPTICAL DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an illumination optical device and a projection exposure device capable of reducing light quantity loss when illuminating a mask with illumination light in a prescribed polarization state.SOLUTION: An illumination optical device comprises: an illumination optical system ILS for illuminating a reticle R with illumination light IL; and a projection optical system for projecting an image of a pattern of the reticle R on a wafer W. The illumination light IL emitted from an exposure light source 1 in a linear polarization state in the illumination optical system ILS passes through first and second double refraction members 12 and 13 with different advance phase axis directions, is converted to a polarization state which is substantially linear polarization in a circumferential direction with an optical axis as a center in an almost specific annular region, and illuminates the reticle R under a condition of annular illumination through a fly eye lens 14 or the like.