摘要 |
Embodiments described herein relate to a base ring assembly for use in a substrate processing chamber. In one embodiment, the base ring assembly comprises a ring body sized to be received within an inner circumference of the substrate processing chamber, the ring body comprising a loading port for passage of the substrate, a gas inlet, and a gas outlet, wherein the gas inlet and the gas outlet are disposed at opposing ends of the ring body, and an upper ring configured to dispose on a top surface of the ring body, and a lower ring configured to dispose on a bottom surface of the ring body, wherein the upper ring, the lower ring, and the ring body, once assembled, are generally concentric or coaxial. |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
ABOAGYE, STEVE;BRILLHART, PAUL;KUMAR, SURAJIT;CHANG, ANZHONG;KUPPURAO, SATHEESH;SAMIR, MEHMET TUGRUL;CARLSON, DAVID K. |