发明名称 MULTILAYER STRUCTURE, METHOD FOR PRODUCING SAME, AND ARTICLE
摘要 A multilayer structure wherein a base, an intermediate layer and an outermost layer are sequentially laminated. The intermediate layer has a Martens hardness of 120 N/mm2 or more; the outermost layer has an elastic modulus recovery ratio of 70% or more; and the surface of the outermost layer is provided with a microrelief structure that has a pitch not more than the wavelength of visible light. A method for producing a multilayer structure wherein a base, an intermediate layer and an outermost layer are sequentially laminated, which comprises the following steps (1)-(3). Step (1): a step wherein an active energy ray curable resin composition (X) containing a compound having a polymerizable functional group is arranged on a light-transmitting base, and then first active energy ray irradiation is carried out, thereby forming an intermediate layer in which the rate of reaction of the polymerizable functional group in the surface is 35-85% by mole Step (2): a step wherein an active energy ray curable resin composition (Y) is arranged between the intermediate layer and a mold for microrelief structure transfer Step (3): a step wherein second active energy ray irradiation is carried out from the base side, so that the resin composition (Y) is cured so as to form an outermost layer, and then a multilayer structure is released from the mold
申请公布号 WO2014163198(A1) 申请公布日期 2014.10.09
申请号 WO2014JP60016 申请日期 2014.04.04
申请人 MITSUBISHI RAYON CO., LTD. 发明人 NAKAI YUSUKE;OTANI GO;OZAWA SATORU;JIGAMI TETSUYA
分类号 B32B3/30;B29C39/18;B29C39/20;B29C59/02;G02B1/11 主分类号 B32B3/30
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