METHOD FOR CLEANING PROCESS KIT AND CHAMBER, AND METHOD FOR RECOVERING RUTHENIUM

摘要

PROBLEM TO BE SOLVED: To provide a method for recovering ruthenium so as to be reused, by cleaning deposited ruthenium from a vapor deposition apparatus, in manufacture of an electronic device.SOLUTION: A method is provided for recovering a metal from electronic device deposition equipment including: providing 102 deposition equipment at least partially coated with a deposited metal; blasting 106 the deposition equipment with a grit to remove at least some of the deposited metal to form a blasted grit and a removed metal; and separating at least some of the removed metal from the blasted grit to dissolve the blasted grit recovering a metal.