| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pattern forming method that prevents resin or a mold from being broken when a nano-imprint mold is released from the resin.SOLUTION: A pattern forming apparatus by nano-imprint for controlling an amount of light radiated to a transfer substrate stage by moving plural movable members 501, 502 comprises: a mold chuck for holding a mold; a transfer substrate stage on which a transfer substrate is arranged; a light source arranged on at least any one of a mold chuck side and a transfer substrate side, and radiating light to the transfer substrate arranged on the transfer substrate stage; and an aperture 500 arranged between the light source and the transfer substrate stage and constituted by the plural movable members 501, 502.</p> |
