| 发明名称 |
RESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, AND RESIST SOLVENT |
| 摘要 |
A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate. |
| 申请公布号 |
US2014302438(A1) |
申请公布日期 |
2014.10.09 |
| 申请号 |
US201414247449 |
申请日期 |
2014.04.08 |
| 申请人 |
JSR CORPORATION |
发明人 |
ASANO Yusuke;NAKAMURA Shin-ichi;FUTAI Tomonori |
| 分类号 |
G03F7/038 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A resist composition comprising:
a polymer that includes an acid-labile group-containing structural unit; a photoacid generator; and a solvent including a compound, the compound including a ketonic carbonyl group and an alcoholic hydroxyl group. |
| 地址 |
Tokyo JP |
