PROCESS OF MANUFACTURING PATTERN STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a process of manufacturing a pattern structure capable of relatively reducing an amount of coating of a lift-off material and enhancing thickness uniformity of the lift-off material.SOLUTION: The process of manufacturing a pattern structure includes forming a lift-off material 12 on a substrate 10 using a coating applicator 20 having a brush 34. Next, on the substrate 10 and the lift-off material 12, a functional film 14 is formed by an atomic layer deposition method. Next, by removing the lift-off material 12 by a lift-off method, a pattern 14a is formed from the functional film 14 on the substrate 10.