DENSE OXIDE COATED COMPONENT OF PLASMA PROCESSING CHAMBER AND METHOD OF MANUFACTURE THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment.SOLUTION: A method comprises cold spraying a layer of pure aluminum 130 on a surface 112 of an aluminum component 100 to a predetermined thickness, and then forming a dense oxide coating 120 on the layer of pure aluminum 130 using a plasma electrolytic oxidation process. The plasma electrolytic oxidation process causes the layer 130 of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating 120 on the layer of pure aluminum 130 on the surface 112 of the aluminum component 100.