发明名称 |
ALKALI-SOLUBLE RESIN, PREPARATION METHOD THEREFOR, AND PHOTORESIST COMPOUND CONTAINING SAID RESIN |
摘要 |
An alkali-soluble resin, a preparation method therefor, and a photoresist compound containing said resin. The alkali-soluble resin is an acrylic-acid resin containing a polyether chain. The photoresist compound containing the present alkali-soluble resin can reduce the gradient angle of a film layer, thereby avoiding light leakage due to the occurrence of gaps at the joint between a color film layer and a black matrix, and improving the coating of, and friction effect of, the alignment layer. |
申请公布号 |
WO2014161251(A1) |
申请公布日期 |
2014.10.09 |
申请号 |
WO2013CN80171 |
申请日期 |
2013.07.26 |
申请人 |
BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
WANG, XUELAN;TANG, CHEN;CHANG, SHAN |
分类号 |
C08F220/06;C08F220/08;C08F220/18;C08F265/02;C08G65/00;C08G81/02;G03F7/004;G03F7/027 |
主分类号 |
C08F220/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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