发明名称 ALKALI-SOLUBLE RESIN, PREPARATION METHOD THEREFOR, AND PHOTORESIST COMPOUND CONTAINING SAID RESIN
摘要 An alkali-soluble resin, a preparation method therefor, and a photoresist compound containing said resin. The alkali-soluble resin is an acrylic-acid resin containing a polyether chain. The photoresist compound containing the present alkali-soluble resin can reduce the gradient angle of a film layer, thereby avoiding light leakage due to the occurrence of gaps at the joint between a color film layer and a black matrix, and improving the coating of, and friction effect of, the alignment layer.
申请公布号 WO2014161251(A1) 申请公布日期 2014.10.09
申请号 WO2013CN80171 申请日期 2013.07.26
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 WANG, XUELAN;TANG, CHEN;CHANG, SHAN
分类号 C08F220/06;C08F220/08;C08F220/18;C08F265/02;C08G65/00;C08G81/02;G03F7/004;G03F7/027 主分类号 C08F220/06
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