PHASE SHIFT MASK BLANK, METHOD FOR PRODUCING THE SAME, PHASE SHIFT MASK, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING DISPLAY

摘要

PROBLEM TO BE SOLVED: To provide a phase shift mask blank capable of being formed into a cross-sectional shape effectively exhibiting a phase effect by wet etching.SOLUTION: Provided is a phase shift mask blank comprising: a transparent substrate; an optical semi-permeable film formed on the main surface of the transparent substrate and composed of a metal silicide based material; and a chromium based material formed on the optical semi-permeable film and composed of a chromium based material. A composition-inclined region P is formed on the boundary between the optical semi-permeable film and the etching mask film, and, in the composition-inclined region P, the ratio of components delaying the wet etching rate of the optical semi-permeable film is stepwise and/or continuously increased toward a depth direction.