发明名称 METHODS AND FABRICATION TOOLS FOR FABRICATING OPTICAL DEVICES
摘要 An embodiment of the present invention relates to a method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component,determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state,elaborating a device pattern based on the position of the at least one optical component, andfabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.
申请公布号 US2014302442(A1) 申请公布日期 2014.10.09
申请号 US201313856621 申请日期 2013.04.04
申请人 SCHELL Andreas;Fischer Joachim;Kaschke Johannes;Benson Oliver;Wegener Martin 发明人 SCHELL Andreas;Fischer Joachim;Kaschke Johannes;Benson Oliver;Wegener Martin
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. Method of fabricating an optical device, the method comprising the steps of: depositing a photoresist layer on a carrier, said photoresist layer containing at least one optical component, determining the position of the at least one optical component inside the photoresist layer before exposing the photoresist layer to a first radiation, said first radiation being capable of transforming the photoresist layer from an unmodified state to a modified state, elaborating a device pattern based on the position of the at least one optical component, and fabricating the elaborated device pattern by locally exposing the photoresist layer to the first radiation and locally transforming the photoresist layer from the unmodified state to the modified state.
地址 Berlin DE
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