发明名称 FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.
申请公布号 US2014300879(A1) 申请公布日期 2014.10.09
申请号 US201414179276 申请日期 2014.02.12
申请人 ASML NETHERLANDS B.V. 发明人 KEMPER Nicolaas Rudolf;Van Ballegoij Robertus Nicodemus Jacobus;Vermeulen Marcus Martinus Petrus Adrianus;Riepen Michel;Van Den Heuvel Martinus Wilhelmus;Berkvens Paul Petrus Joannes;De Metsenaere Christophe;Van De Winkel Jimmy Matheus Wilhelmus;Rops Cornelius Maria
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址 Veldhoven NL
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