发明名称 NONVOLATILE MEMORY DEVICE
摘要 A nonvolatile memory device includes a gate structure including a select gate formed over a substrate and a memory gate formed on one sidewall of the select gate and having a P-type channel, a drain region formed in the substrate at one sidewall of the gate structure and overlapping a part of the memory gate, and a source region formed in the substrate at the other sidewall of the gate structure and overlapping a part of the select gate. The memory gates include a grid of rows and columns with bits of 1's and 0's selectively forming a memory in a nonvolatile memory device.
申请公布号 US2014299930(A1) 申请公布日期 2014.10.09
申请号 US201313954499 申请日期 2013.07.30
申请人 SK hynix Inc. 发明人 PARK Sung-Kun
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项 1. A nonvolatile memory device comprising: a gate structure comprising a select gate formed over a substrate and a memory gate formed on one sidewall of the select gate and having a P-type channel; a drain region formed in the substrate at one sidewall of the gate structure and overlapping a part of the memory gate; and a source region formed in the substrate at the other sidewall of the gate structure and overlapping a part of the select gate.
地址 Gyeonggi-do KR