发明名称 CATA-DIOPTRIC TYPE PROJECTION OPTICAL SYSTEM, EXPOSURE DEVICE, AND EXPOSURE METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a relatively compact projection optical system having superior imaging performance having various aberrations such as a chromatic aberration and a field curvature excellently corrected, and capable of securing a large effective image-side numerical aperture by excellently suppressing reflection loss on an optical plane.SOLUTION: A cata-dioptric type projection optical system for forming a reduced image of a first plane R on a second plane W comprises at least two reflecting mirrors CM1 and CM2 and transparent members L11 to L217. The cata-dioptric type projection optical system comprises an arcuate effective imaging region not including an optical axis AX of the projection optical system. In the cata-dioptric type projection optical system, a condition of 1.05<R/Y0<12 is satisfied, where R is size of a radius of curvature of an arc defining the effective imaging region and Y0 is a maximum image height on the second plane.</p>
申请公布号 JP2014194552(A) 申请公布日期 2014.10.09
申请号 JP20140093069 申请日期 2014.04.28
申请人 NIKON CORP 发明人 OMURA YASUHIRO
分类号 G02B17/08;H01L21/027 主分类号 G02B17/08
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