| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical device wafer, with which the optical device wafer in which the surface of an optical device layer is unevenly formed can be efficiently manufactured. SOLUTION: The method of manufacturing the optical device wafer having the optical device layer laminated on the surface of a sapphire substrate includes: an unevenness forming step of forming fine uneven waviness on the surface of the sapphire substrate by grinding the surface of the sapphire substrate; and an optical device layer-forming step of laminating and forming the optical device layer on the surface of the sapphire substrate on which the unevenness forming process is performed. COPYRIGHT: (C)2011,JPO&INPIT |
