| 摘要 |
<p>PURPOSE: A plasma processing apparatus for large area substrates is provided to maintain the distance between a susceptor and showerhead by a certain interval by including a spacer member. CONSTITUTION: In a plasma processing apparatus for large area substrates, a suscepter(310) mounts a semiconductor substrate. A showerhead(320) is arranged in the top side of the susceptor. A susceptor supporting member(350) supports susceptor from the bottom thereof An ascending shaft is ascended by an extern lifting apparatus and lifts the susceptor supporting members. The ascending shaft is vertically installed in the both ends of the susceptor supporting member. A spacer member(330) keeps the interval between the showerhead and the susceptor.</p> |
